IBS Institute for Basic Science
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Mask aligner

equipment explanation
Model MA6 SUSS
Operating time SUN(00:00~24:00)
MON(00:00~24:00)
TUE(00:00~24:00)
WED(00:00~24:00)
THU(00:00~24:00)
FRI(00:00~24:00)
SAT(00:00~24:00)
Location 86698
inquiry Ryu JungHyun
010-3706-4726
Reservation

Notice

 

* This equipment is in clean room * 

 

Available Time // Always possible.

 

Notice // If you want to have training for using this equipment please contact Super-user.

 

Current Status // Now on operation.

This equipment is lithography tool with exposure system.
It is for adjustment a glass mask to a wafer with submicron precision.

 

1. Top side Alignment Bottom side Alignment
2. IR alignment
3. Maximum substrate Size : 6“x6“
4. Accurate and precise gap setting for high yield
5. Parameter storage saves set-up time and improves process consistency
6. High-quality diffraction reducing exposure optics : For high resolution and optimum edge quality
7. High intensity light sources reduce process time
8. UV 400 UV300 UV 250 UV 200(Excimer laser)
9. Upgradable with retrofit kits for Nano Imprint Lithography (NIL)
10. Offers a large variety of options

LIST