Center for Relativistic Laser Science

1. Equipment name : Sputter system (자기양자센서 스퍼터 시스템)

2. Manufacture and Model

- Synwiz 2017

- Customized model

3. Purpose : This equipment is used to measurement for low temperature detectors. A device for sputtering a superconducting film and a metal film of a low-temperature detector sensor.

4. Specification and performance

  (1) Main process chamber

   - 5 putter guns has individual gate valve

   - sample : miximum 4” wafer

   - adjustment of the distance between sputter gun and wafer

   - rotational waver chuck including water cooling

   - available co-sputtering by controlling of gun position

  (2) load-rock chamber

   - RF Ion etching for removing the oxidized and anodized surface

   - wafer adjustment (for the uniform etch ratio) : periodic longitudinal movement

5. Location and Picture :

- IBS head quarter, C169 clean room 1000 (deposition room)