IBS Institute for Basic Science
Search
Home Print Page

Thermal Chemical Vapor Deposition (TCVD)

equipment explanation
Model Customized
Operating time MON(00:00~24:00)
TUE(00:00~24:00)
WED(00:00~24:00)
THU(00:00~24:00)
FRI(00:00~24:00)
Location 86591
inquiry Sanghyub Lee
010-6769-3746
tkdguq91@skku.edu
Reservation

ㅡInformationㅡ

 

 

 

TCVD is used for device annealing in atmosphere pressure. Temperature variation is from 25 degree to 1000 degree Celsius. Both Argon and Hydrogen can be flowed in the chamber. 

LIST