IBS Institute for Basic Science
Search
Home Print Page

Inductively Coupled Plasma Mass Spectrometer (ICP-MS)
유도 결합 플라즈마 질량분석기

equipment explanation
Model - Agilent Technologies, 2015
- Agilent 7900 ICP-MS
Operating time 09:00 ~ 18:00
Location C177, ICP-MS
inquiry

1. 장비명 : 유도 결합 플라즈마 질량분석기

            Inductively Coupled Plasma Mass Spectrometer (ICP-MS)

    

2. 제조사 및 모델명 :

- Agilent Technologies, 2015

- Agilent 7900 ICP-MS

    

3. 장비 목적 :

ICP-MS is used to analyze trace impurities of various materials for low background research. The impurity levels before and after purification or crystal growth are evaluated mainly for the materials of single crystal growth. The main measurement elements are K, Sr, Ba, Pb, Th, U.

    

4. 주요 구성 및 성능 :

Instrument Performance

    

    

Sensitivity

(Mcps/ppm)

89Y

600

205Tl

520

238U

720

Background

m/z 9

<0.3 cps

Detection limits

9Be

<0.05 ppt

115In

<0.02 ppt

209Bi

<0.02 ppt

Oxide

CeO/Ce

<1.8%

Doubly charged

Ce2+/Ce

<2.5%

Stability

20 min

<1.0% RSD

2 hr

<1.2% RSD

    

Specifications

    

    

Sample Introduction System

Peristaltic pump

10-roller, 3 channels

Spray chamber

–5 °C to +20 °C

Ultra High Matrix Introduction system (UHMI)

Plasma

RF generator

27Mhz

500Wto1600W

OctopoleReactionSystem

(ORS)

He (collision) cell gas line

Included

H2 (reaction) cell gas line

Optional

3rdcellgasline

(low-orhigh-flowrate)

Optional

Mass analyzer

Mass range

2–260 u

Mass resolution

Variable from 0.3 u to 1.0 u

Detector

Dynamic range

11orders

(0.1cpsto10Gcps)

Minimum integration time

100 μs

    

    

5. 장치 위치 및 사진 :

- C177, ICP-MS

LIST