IBS Institute for Basic Science
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ALD

equipment explanation
Model Lucida D100
Operating time SUN(00:00~24:00)
MON(00:00~24:00)
TUE(00:00~24:00)
WED(00:00~24:00)
THU(00:00~24:00)
FRI(00:00~24:00)
SAT(00:00~24:00)
Location 86391
inquiry Byeonghoon Lee
010-9075-5107
zxvpwr7@naver.com
Reservation

Notice

 

Available Time // Except 12:00~18:00 on Mon~Thur.

 

Notice // If you want to have training for using this equipment, please contact Super-user.

 

Current Status // Now on operation.

ALD is an equipment used for thin film deposition. Since we can control film thickness in atomic scale, this is inevitable in nanoscience and semiconductor science.


Material: TMA(Aluminum precursor), TEMAHf(Hafnium precursor)
Substrate size: 100~200[mm]
Substrate temperature: 300[K]~620[K](±0.2K) at 1[Torr], in wafer
Precursor Sources: 3, heated 2 sources and H2O source
Deposition Uniformity : <±2[%]

 

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